22-26 February, 2021

SPIE Advanced Lithography 2021 digital forum


Mycronic attends SPIE Advanced Lithography 2021, the leading event for the lithography community where leaders come to solve challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications.

In the presentation “A new generation cost-efficient mask writer for mature semiconductor nodes” Mycronic will share key technologies used in SLX series and how to achieve the cost effective mask manufacturing and demonstrates the superiority of the system by recent evaluation data.

Entire program on SPIE Advanced Lithography 2021 website

SPIE Advanced Lithography 2021 will take place online and will include the Marketplace, where attendees come to find new products and make important business connections. Five days of presentations and special events offer opportunities for interaction with potential customers. Participating companies will be able to share their offerings, provide product demonstrations, and make important connections online.