Display mask
metrology system


Display mask
metrology system


Display mask
metrology system

Mask metrology system

prove your quality

To demonstrate specs compliance, you must be able to prove that the patterns on photomasks will be properly aligned during the production of the display. In order to accomplish this, you need measurement equipment with even better precision than the laser mask writer.

The Prexision MMS series are built on the new state-of-the-art control platform called Evo, designed to support growing trends within automation, connectivity and big data in mask manufacturing environment in order to achieve higher product yield. The Evo platform is based upon a fully modern software and electronics architecture ready to meet both current and future requirements from the industry. Learn more about the Evo control platform.

Key benefits

  • 30%

    Better registration
  • 20%

    Better overlay mask to mask
  • 30%

    Shorter turnaround time

(In comparison with previous MMS model - MMS-15000)


  • Superior accuracy and repeatability with the latest innovative Prexision Evo platform.
  • Improved registration measurements with our proprietory technologies.
  • Faster turnaround time, because you can trust the first-time measurement result.
  • Utilizes the full potential of our Prexision laser mask writers.

The Prexision MMS Evo – based on the most accurate Prexision Evo platform – takes registration measurements over large areas to a completely new level. Now you can show just how good your photomasks are.

The performance of your measurement system is also critical for fine-tuning laser mask writers in order to utilize their full capabilities, so that your photomasks are written with the highest quality.

Prexision MMS Evo is offered with two models. G8 model can deal with the mask size that used for up to display generation 8 glass size. For G10 model, up to display generation 11 glass size.



  Prexision MMS
G8 Evo model
Prexision MMS
G10 model
Overlay the mask-to-mask 3σ [nm] 40
Registration 3σ [nm] 65
CD repeatability 3σ [nm] 50
The mask size [mm] 1400 x 1620 1700 x 2000




Your best partner

With more than 40 years in the electronics industry and a unique market leading position you can count on us.  We understand the fast changes in the market and have a strong local presence in over 50 countries to help our customers. We deliver technologies that are future proof and are devoted to our mission and our clients.

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