Multi-purpose mask writer
Multi-purpose mask writer
- Flexibility Broad product configuration offering
- Productivity Increased writing speed with XT mode
- Stability Unmatched system uptime
Multi-purpose photomask manufacturing gets unparalleled flexibility
Mycronic’s multi-purpose mask writer, the FPS Evo series can be flexibly configured to address various photomask applications, such as advanced electronic packaging, wafer direct writing, LED touch screens, MEMs, color filters and fine metal masks for display, 3D molds, and more.
The FPS Evo series is built on the new state-of-the-art control platform called Evo, designed to support growing trends within automation, connectivity, and big data in mask manufacturing environments in order to achieve higher product yield. The Evo platform is based upon a fully modern software and electronics architecture ready to meet both current and future requirements from the electronics industry.
FPS 10 Evo
The FPS 10 Evo is the latest addition of FPS family, specially designed to meet the growing trend from LCD to AMOLED displays, which requires fine metal masks for the deposition process of organic materials. The transition to AMOLED trends is also seen in IT displays, such as laptop, tablet and desktop monitors which are planned to be manufactured from generation 8 display fabs to secure productivity which requires very large size of photomask.
- Two optical writing levels
- Multi-beam writing
- Off-line data path
- Very large size photomask handling
FPS 8100 Evo
The FPS 8100 Evo is also specially designed to produce photomask for fine metal mask manufacturing. The system can handle photomask size for fine metal masks that is used in generation 6 AMOLED display fabs.
- Two optical writing levels
- Multi-beam writing
- Off-line data path
- 1400 x 1620mm substrate size handling
- Various loading solutions
FPS 6100 Evo and FPS 6100E Evo
Reliable and well field proven, the FPS 6100 Evo is the chrome mask writer that is used by some of the world’s leading photomask manufacturers to achieve superior image quality and productivity for advanced multi-purpose applications.
FPS 6100E Evo is an emulsion mask writer which adopt the same technology used in other Mycronics’ mask writer providing unmatched stability and reliability.
- Six optical writing levels for chrome writer and three optical writing levels for emulsion writer
- XT mode to boost writing speed by up to 76%
- Off-line data path
- 3D writing option
- Multi-beam writing
Specifications
FPS 8100 Evo |
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| Writing levels | Lvl 40 | Lvl 25 |
| Minimum L/S resolved (pitch/2) | 2 µm | 3.5 µm |
| CD Uniformity (3σ) | 60 nm | 80 nm |
| Overlay (3σ) | 100 nm | 120 nm |
| Writing speed | 4500 mm²/min | 6500 mm²/min |
| Max. mask size | 1400x1620 mm | |
FPS 6100 Evo |
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| Writing levels | Lvl 80 | Lvl 60 | Lvl 40 | Lvl 25 | Lvl 20 | Lvl 15 |
| Minimum L/S resolved (pitch/2) | 0.75 µm | 1.2 µm | 2.0 µm | 3.5 µm | 5.0 µm | 7.0 µm |
| CD Uniformity (3σ) | 30 nm | 40 nm | 60 nm | 80 nm | 100 nm | 200 nm |
| Overlay (3σ) | 70 nm | 85 nm | 100 nm | 120 nm | 140 nm | 160 nm |
| Writing speed | 525 mm²/min | 1250 mm²/min | 2600 mm²/min | 6000 mm²/min | 8000 mm²/min | 12000 mm²/min |
| Max. mask size | 1100 x 1100 mm and 900 x 1200 mm | |||||
FPS 6100E Evo |
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| Writing levels | Lvl 25 | Lvl 20 | Lvl 15 |
| Minimum L/S resolved (pitch/2) | 1.6 µm | 2.1 µm | 2.4 µm |
| CD Uniformity (3σ) | 250 nm | 350 nm | 450 nm |
| Overlay (3σ) | 120 nm | 140 nm | 160 nm |
| Writing speed | 5000 mm²/min | 10000 mm²/min | 12000 mm²/min |
| Max. mask size | 1100 x 1100 mm and 900 x 1200 mm | ||
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