Display mask writer
- Productivity For high demands regarding mask writers
- Stability Exceptional MURA quality control
- Flexibility Extreme writing speed with multi beams
Description
World-leading mask writers for tomorrow’s display standards
Everywhere we look today, we find ourselves surrounded by sophisticated display technologies. From TVs and digital signage, to smartphones, IT devices and near eye displays, the Prexision Evo series of laser mask writers play a critical role in this technological revolution. All the world’s manufacturers of advanced flat panel displays use the Prexision Evo series of laser mask writers.
The Prexision Evo series is built on the new state-of-the-art control platform called Evo, designed to support growing trends within automation, connectivity, and big data in the mask manufacturing environment in order to achieve higher product yield. The Evo platform is based upon a fully modern software and electronics architecture ready to meet both current and future requirements from the industry.
Prexision Evo series
Mycronic Prexision series
Prexision 8000 Evo
Displays continue to innovate delivering splendid imaging experiences puts an ever-increasing demand for higher refresh rates with energy efficiency considered in combination with larger display size. In addition, emerging extended reality market, requiring high resolution near-eye displays push the need for higher precision due to complexity increase in pixel design to a new, previously unseen level. The Prexision 8000 Evo is the latest and most advanced mask writer to date. It introduces a series of innovation that greatly improve resolution, positioning accuracy and stability without jeopardizing productivity. The Prexision 8000 Evo will counter all challenges seen in these days and will effectively support in developing the displays of the future.
Prexision 800 Evo and Prexision 80 Evo
Rapid advancements in display technology – such as smaller pixels and increasingly complex designs like AMOLED – are driving higher demands for photomask quality.
The Prexision 800 Evo and Prexision 80 Evo are designed to meet these challenges with outstanding performance.
The Prexision 800 Evo delivers 25% higher resolution and significantly improved CD uniformity without jeopardizing productivity. The Prexision 80 Evo achieves 70% better global and local placement accuracy compared with the Prexision 8 Evo.
Together, they set a new standard for photomask quality in advanced display manufacturing.
Prexision 8 Evo and Prexision 10
Prexision 8 Entry Evo and Prexision Lite 8 Evo
Prexision 8 Entry Evo and Prexision Lite 8 Evo is designed to meet the requirements for cost-efficient production of photomasks for mainstream displays up to G8 mask size. Despite the clear trend towards more advanced photomasks for displays, the market for less complex photomasks will remain a significant and important segment. Prexision 8 Entry Evo is upgradable to complete Prexision 8 Evo offering a wide range of choices depending on the user’s business strategy.
Specification
Prexision 8000 Evo |
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| Mode | HA | HT |
| Minimum L/S resolved (pitch/2) | 500 nm | 750 nm |
| CD accuracy (range of averages) | 15 nm | 20 nm |
| Mask set overlay (3σ) | 65 nm | 90 nm |
| Writing speed | 900 mm²/min | 1200 mm²/min |
| Max. mask size | 1400 x 1620 mm | |
Prexision 800 Evo |
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| Mode | HA | HT |
| Minimum L/S resolved (pitch/2) | 550 nm | 850 nm |
| CD accuracy (range of averages) | 15 nm | 20 nm |
| Mask set overlay (3σ) | 75 nm | 100 nm |
| Writing speed | 900 mm²/min | 1200 mm²/min |
| Max. mask size | 1400 x 1620 mm | |
Prexision 80 Evo |
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| Mode | HA | HT |
| Minimum L/S resolved (pitch/2) | 750 nm | 1000 nm |
| CD accuracy (range of averages) | 30 nm | 35 nm |
| Mask set overlay (3σ) | 75 nm | 100 nm |
| Writing speed | 900 mm²/min | 1200 mm²/min |
| Max. mask size | 1400 x 1620 mm | |
Prexision 8 Evo |
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| Mode | HA | HT |
| Minimum L/S resolved (pitch/2) | 750 nm | 1000 nm |
| CD accuracy (range of averages) | 70 nm | 85 nm |
| Mask set overlay (3σ) | 90 nm | 120 nm |
| Writing speed | 900 mm²/min | 1200 mm²/min |
| Max. mask size | 1400 x 1620 mm | |
Prexision 10 |
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| Mode | HA | HT |
| Minimum L/S resolved (pitch/2) | 750 nm | 1000 nm |
| CD accuracy (range of averages) | 70 nm | 85 nm |
| Mask set overlay (3σ) | 90 nm | 120 nm |
| Writing speed | 900 mm²/min | 1200 mm²/min |
| Max. mask size | 1700 x 2000 mm | |
Prexision 8 Entry Evo and Prexision Lite 8 Evo |
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| System | Prexision 8 Entry Evo | Prexision Lite 8 Evo |
| Minimum L/S resolved (pitch/2) | 1200 nm | 1200 nm |
| CD accuracy (range of averages) | 85 nm | 85 nm |
| Mask set overlay (3σ) | 120 nm | N/A |
| Writing speed | 1350 mm²/min | 1350 mm²/min |
| Max. mask size | 1400 x 1620 mm | |
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